Blank Cover Image

Effective data compaction algorithm for vector scan EB writing system

Author(s):
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
589
Page(to):
600
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings New data processing of dummy pattern generation adaptive for CMP process

Ueki, S., Ashida, I., Kawahira, H.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Data processing for LEEPL mask: splitting and placement correction

Ashida, I., Omori, S., Ohnuma, H.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Proposal of new layout data format for LSI patterns

Ashida, I., Sato, Y., Kawahira, H.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system

Hara,S., Murakami,E., Magoshi,S., Koyama,K., Anze,H., Ogawa,Y., Kabeya,A., Ooki,S., Saito,T., Fujii,T., Sakamoto,S., …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings New mask data verification method after optical proximity effect correction

Ogawa,K., Ashida,I., Kawahira,H.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Evaluation of an advanced mask-writing system

Kubo, S., Hiruta, K., Sugiyama, M., Iwamatsu, T., Fujisawa, T., Morimoto, H.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Development of fast linewidth correction system

Takenouchi,R., Ashida,I., Kawahira,H.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Using an expert system with genetic algorithm for effective multilink manipulator path planning

Yussupova, N.I., Kussimov, S.T., Woern, H., Shakhmametova, G., Nikiforov, D.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings New mask data processing system for ULSI fabrication

Takenouchi,R., Ohnuma,H., Ashida,I., Nozawa,S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Writing accuracy of EBM-3500 electron-beam mask writing system

Ohtoshi,K., Sunaoshi,H., Takamatsu,J., Okabe,F., Ishibashi,K., Yoshitake,S., Yamada,H., Tamamushi,S., Anze,H., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Comparison of mulitpass gray strategy and conventional writing method

Kagami, I., Koyama, M., Kawahira, H.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Fast chip-level OPC system on mask database

Ohnuma,H., Tsudaka,K., Kawahira,H.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12