Evaluation of loading effect of NLD dry etching: ?
- Author(s):
Fujisawa,T. Iwamatsu,T. Hiruta,K. Morimoto,H. Harashima,N. Sasaki,T. Hara,M. Yamashiro,K. Ohkubo,Y. Takehana,Y. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 549
- Page(to):
- 552
- Pages:
- 4
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
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New structure of ArF high-transmittance attenuated phase-shifting mask with dry etching process
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