Dry etching technology of Cr and MoSi layers using high-density plasma source
- Author(s):
Kwon,H.-J. Oh,K.-S. Chang,B.-S. Choi,B.-Y. Park,K.-H. Jeong,S.-H. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 532
- Page(to):
- 539
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
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