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Dry etching technology of Cr and MoSi layers using high-density plasma source

Author(s):
Kwon,H.-J.
Oh,K.-S.
Chang,B.-S.
Choi,B.-Y.
Park,K.-H.
Jeong,S.-H.
1 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. date:
2000
Vol.:
4186
Page(from):
532
Page(to):
539
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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