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Improved process control of photomask fabrication in e-beam lithography

Author(s):
Cha,B.-C.
Park,J.-H.
Choi,Y.-H.
Kim,J.-M.
Han,W.-S.
Yoon,H.-S.
Sohn,J.-M.
2 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. date:
2000
Vol.:
4186
Page(from):
508
Page(to):
512
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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