Effect of beam blur in mask fabrication
- Author(s):
Yang,S.-H. Ki,W.-T. Moon,S.-Y. Jeong,T.-M. Choi,S.-W. Han,W.-S. Sohn,J.-M. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 468
- Page(to):
- 473
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Study of the beam blur and its effect on the future mask fabrication [6349-33]
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |