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Technological challenges in implementation of alternating phase-shift mask

Author(s):
Tsai,W.
Qian,Q.
Buckmann,K.M.
Cheng,W.-H.
He,L.
Irvine,B.
Kamna,M.
Korobko,Y.
Kovalchick,M.
Labovitz,S.M.
Talevi,R.
Farnsworth,J.N.
7 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. date:
2000
Vol.:
4186
Page(from):
433
Page(to):
443
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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