Blank Cover Image

Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography

Author(s):
Ham,Y.-M.
Kim,S.-M.
Kim,S.-J.
Bae,S.-M.
Kim,Y.-D.
Baik,K.-H.
1 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
359
Page(to):
371
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., …

SPIE-The International Society for Optical Engineering
7 Conference Proceedings KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process

Kim,J., Kim,S.-C., Kim,H.-C., Lee,S.-I., Choi,Y.-K., Ham,Y.-M., Han,O.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings TiSi-nitride-based attenuated phase-shift mask for ArF Lithography

Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world

Kim, I.-S., Jung, S.-G., Kim, H.-D., Yeo, G.-S., Shin, I.-K., Lee, J.-H., Cho, H.-K., Moon, J.-T.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Comparison study for sub-150-nm DUV lithography between high-NA KrF and ArF lithography

Yim,D., Kwon,K.-S., Ham,Y.-M., Baik,K.-H.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Application of attenuated phase-shifting masks to sub-130-nm lithography

Koo,C.-K., Choo,L.-C., Lin,Q., Tan,S.-S., Lee,H.-J., Tam,S.-C., See,A.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography

Kim,S.-K., Kim,Y.-S., Kim,J.-S., Bok,C.-K., Ham,Y.-M., Baik,K.-H.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

Petersen,J.S., Socha,R.J., Naderi,A.R., Baker,C.A., Rizvi,S.A., BanDenBroeke,D., Kachwala,N., Chen,F., Laiding,S., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Attenuated phase-shifting mask in ArF lithography

Miyazaki, J., Uematsu, M., Nakazawa, K., Matsuo, T., Onodera, T., Ogawa, T.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Feasibility studies of ArF Lithography for sub-130-nm lithography

Lee,S.-H., Yim,D., Ham,Y.-M., Baik,K.-H., Choi,I.H.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF

Kang, M.-A., Kim, S.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12