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Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Author(s):
Koo,S.-S.
Kim,H.-B.
Yune,H.-S.
Hong,J.-S.
Paek,S.-W.
Eom,T.-S.
Ahn,C.-N.
Ham,Y.-M.
Baik,K.-H.
Lee,K.-Y.
Kim,L.-J.
Kim,H.-S.
7 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
346
Page(to):
358
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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