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Effect of mask reduction ratio in alternating phase-shift masks

Author(s):
Shin,I.-G.
Lee,S.-W.
Kim,Y.-H.
Choi,S.-W.
Han,W.-S.
Sohn,J.-M.
Lim,T.-K.
2 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. date:
2000
Vol.:
4186
Page(from):
309
Page(to):
315
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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