Advanced FIB mask repair technology for ArF lithography: ?
- Author(s):
Kubo,S. Hiruta,K. Morimoto,H. Yasaka,A. Hagiwara,R. Adachi,T. Morikawa,Y. Iwase,K. Hayashi,N. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 158
- Page(to):
- 164
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
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