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New concept photomask repeater with stitching exposure technique

Author(s):
Irie,N.
Muramatsu,K.
Ishii,Y.
Magome,N.
Umatate,T.
Kyoh,S.
Tanaka,S.
Inoue,S.
Higashikawa,I.
Mori,I.
Okumura,K.
6 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
34
Page(to):
45
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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