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Sensitivity of polysilicon and polycide antenna MOS capacitor to ion implantation charging effects

Author(s):
Publication title:
Process Control and Diagnostics
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4182
Pub. date:
2000
Vol.:
4182
Page(from):
66
Page(to):
71
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438430 [081943843X]
Language:
English
Call no.:
P63600/4182
Type:
Conference Proceedings

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