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Yield-limiting NMOSFET gate depletion in a deep submicrometer CMOS process

Author(s):
Karnett,M.P.
Qian,S.
Mitchell,T.
Subramaniam,V.
Sur,H.
Haby,B.J.
Brugge,H.B.
2 more
Publication title:
Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4181
Pub. Year:
2000
Page(from):
191
Page(to):
199
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438423 [0819438421]
Language:
English
Call no.:
P63600/4181
Type:
Conference Proceedings

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