Blank Cover Image

Advanced lithography kits: serifs and hammerhead

Author(s):
Publication title:
Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4181
Pub. Year:
2000
Page(from):
87
Page(to):
98
Pages:
12
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438423 [0819438421]
Language:
English
Call no.:
P63600/4181
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Global CD uniformity improvement in mask manufacturing for advanced lithography

Chang, S.-M., Chin, C.C., Wang, W.-C., Lu, C.-L., Hsieh, R.-G., Tsay, C.-S., Yen, Y.-S., Chin, S.-C., Lee, H.-C., Liu, …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings CD control enhancement by laser bandwidth stabilization for advanced lithography application

R. C. Peng, T. Wu, K. W. Chang, C. P. Yeh, H. H. Liu

Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Fluorinated dissolution inhibitors for 157-nm lithography

Hamad, A.H., Bae, Y.C., Liu, X.-Q., Ober, C.K., Houlihan, F.M., Dabbagh, G., Novembre, A.E.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings 100-nm node lithography with KrF?

Ferri,J.E., Tyrrell,B., Astolfi,D.K., Yost,D., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Liu,H.Y., …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Image shortening and process development in BEOL lithography

DellaGuardia,R., Warner,D.J., Chen,Z., Stetter,M., Ferguson,R.A., McGuire,A.E., Badger,K.D.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Metrology test reticles for advanced optical lithography

H.M. Marchman, C. Pierrat, J.E. Griffith, J.L. Nistler, A. Williams

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings No-forbidden-pitch SRAF rules for advanced contact lithography [6349-177]

Wang, C.-H., Liu, Q., Zhang, L., Hung, C.-Y.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Novel approach of UV cross-link process for advanced planarization technology in 32-45 nm lithography

S. Takei, Y. Horiguchi, T. Shinjo, B. Ho, Y. Mano, Y. Nakajima, M. Muramatsu, M. Iwashita, K. Tsuchiya

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Lithography and CD performance of advanced MEBES mask pattern generators

Chabala,J.M., Cole,D.M., Pearce-Percy,H.T., Phillips,W., Lu,M., Weaver,S., Alexander,D., Coleman,T., Sauer,C.A., …

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Minimization of Solvent Utilization Using Physicochemical Test Kits

Rahman, M. A., Tarrer, A. R., Guin, J. A., Yen, S. C., Joshi, S. B.

American Institute of Chemical Engineers
6 Conference Proceedings Full-chip lithography manufacturability check for yield improvement [6156-33]

Huang, Y., Tseng, E., Lin, B. S.-M, Yu, C. C., Wang, C.-W., Liu, H.-Y.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Advanced FIB mask repair technology for ArF lithography: ？

Hagiwara,R., Yasaka,A., Takaoka,O., Kozakai,T., Yabe,S., Koyama,Y., Muramatsu,M., Doi,T., Suzuki,K., Okabe,M., Aita,K., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12