Feasibility of very low k1(=0.31) KrF lithography
- Author(s):
- Publication title:
- Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4181
- Pub. Year:
- 2000
- Page(from):
- 17
- Page(to):
- 24
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438423 [0819438421]
- Language:
- English
- Call no.:
- P63600/4181
- Type:
- Conference Proceedings
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