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Precise mask alignment design to crystal orientation of (100) silicon wafer using wet anisotropic etching

Author(s):
Publication title:
Micromachining and microfabrication process technology VI : 18-20 September 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4174
Pub. Year:
2000
Page(from):
462
Page(to):
466
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438300 [0819438308]
Language:
English
Call no.:
P63600/4174
Type:
Conference Proceedings

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