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Influence of annealing conditions on the chemical states of InP/SiO2 nanocomposite films deposited by rf magnetron co-sputtering

Author(s):
Publication title:
Fourth International Conference on Thin Film Physics and Applications : 8-11 May 2000, Shanghai, China : proceedings
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4086
Pub. Year:
2000
Page(from):
213
Page(to):
216
Pages:
4
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437297 [0819437298]
Language:
English
Call no.:
P63600/4086
Type:
Conference Proceedings

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