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REACTIVE ION ETCHING OF SILICON CONTAINING RESISTS

Author(s):
Publication title:
Plasma-surface interactions and processing of materials
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
176
Pub. Year:
1990
Page(from):
503
Page(to):
505
Pages:
3
Pub. info.:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792305842 [0792305841]
Language:
English
Call no.:
N11482/176
Type:
Conference Proceedings

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