APPLICATIONS OF PLASMA ETCHING
- Author(s):
- Lehmann W. H.
- Publication title:
- Plasma-surface interactions and processing of materials
- Title of ser.:
- NATO ASI series. Series E, Applied sciences
- Ser. no.:
- 176
- Pub. Year:
- 1990
- Page(from):
- 345
- Page(to):
- 375
- Pages:
- 31
- Pub. info.:
- Dordrecht: Kluwer Academic Publishers
- ISSN:
- 0168132X
- ISBN:
- 9780792305842 [0792305841]
- Language:
- English
- Call no.:
- N11482/176
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
MECHANISM OF DRY ETCHING OF SILICON DIOXIDE: A CASE OF DIRECT REACTIVE ION ETCHING
Materials Research Society |
7
Conference Proceedings
Characteristics of an Inductively Coupled C12/Ar Plasma and its Application to Cu Etching
Electrochemical Society |
Trans Tech Publications |
Trans Tech Publications |
MRS - Materials Research Society |
Electrochemical Society |
4
Conference Proceedings
Study of lag effect in LPHD plasma etching ofSi for MEMS applications by variable time steps in numerical methods [6032-17]
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Materials Research Society |
11
Conference Proceedings
The surface treatment of silicon wafer by microwave down-stream plasma etching
Society of Photo-optical Instrumentation Engineers |
American Chemical Society |
12
Conference Proceedings
Plasma Etching and Patterning of CVD Diamond at <100。?for Microelectronics Applications
MRS - Materials Research Society |