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IN-SITU XPS STUDIES OF THIN SILICON NITRIDE FILMS ON ?-V SEMICONDUCTORS PRODUCED MY REMOTE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION

Author(s):
Sodhi S. N. R.  
Publication title:
Plasma-surface interactions and processing of materials
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
176
Pub. Year:
1990
Page(from):
327
Page(to):
330
Pages:
4
Pub. info.:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792305842 [0792305841]
Language:
English
Call no.:
N11482/176
Type:
Conference Proceedings

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