Blank Cover Image

Controlling the concentration and position of nitrogen in ultrathin oxynitride films formed by using oxygen and nitrogen radicals

Author(s):
Publication title:
Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
592
Pub. Year:
2000
Page(from):
189
Pub. info.:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995000 [1558995005]
Language:
English
Call no.:
M23500/592
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Ultrathin Oxide Film Formation Using Radical Oxygen in a UHV System

Watanabe, K., Kimura, S., Tatsumi, T.

MRS - Materials Research Society
7 Conference Proceedings Nitrogen Profile Engineering for Tunnel Oxynitrides

Sugizaki, T., Tada, Y., Hikazutani, K-I., Nakanishi, T., Takasaki, K.

MRS - Materials Research Society
2 Conference Proceedings Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique

Karamcheti, A., Watt, V. H. C., Luo, T. Y., Brady, D., Shaapur, F., Vishnubhotla, L., Gale, G., Huff, H. R., Jackson, M. …

MRS-Materials Research Society
8 Conference Proceedings The Effect of Nitrogen Concentration at Silicon Oxynitride Gate Insulators Formed by 28N2+ Implantation into Silicon with Additional Conventional or Rapid …

Felicio, A.G., Diniz, J.A., Godoy Fo., J., Doi, I., Pudeozi, M.A.A., Swart, J.W.

Electrochemical Society
3 Conference Proceedings INVITED: NITROGEN ENGINEERING OF ULTRATHIN SILICON OXYNITRIDES

Green, M.L., Gusev, E.P., Lu, H., Garfunkel, E., Gustafsson, T., Lennard, W.N.

Electrochemical Society
9 Conference Proceedings Impact of a Treatment Combining Nitrogen Plasma Exposure and Forming Gas Annealing on Defect Passivation of SiO2/SiC Interfaces

H. Watanabe, Y. Watanabe, M. Harada, Y. Kagei, T. Kirino

Trans Tech Publications
4 Conference Proceedings Surface and Interface Structures of Ultrathin Silicon Oxynitride Films

Takahashi, K., Inoue, K., Kato, H., Tamura, N., Hikazutani, K., Sano, S., Hattori, T.

Electrochemical Society
10 Conference Proceedings Surface Roughness Control of Zirconia Films Using a Novel Photoresponsive Precursor Molecule for Improving its Photocatalytic Activity

K. Nishizawa, T. Miki, E. Watanabe, H. Taoda

Trans Tech Publications
5 Conference Proceedings Characteristics of Ultrathin CVD Oxynitride Film

Hosaka, T.

Electrochemical Society
11 Conference Proceedings Hyperthermal Nitridation for Ultrathin Silicon Oxynitride Gate Dielectrics

Krug, C., Baumvol, I.J.R., Stedile, F.C., Green, M.L., Klemens, F., Silverman, P.J., Sorsch, T.W., Alvarez, F., Hammer, …

Electrochemical Society
6 Conference Proceedings Ultrathin Silicon Oxynitride Gate Dielectrics

Gusev, E.P., D'Emic, C.P., Zabel, T.H., Copel, M.

Electrochemical Society
12 Conference Proceedings Recent Developments In Ultrathin Oxynitride And Oxide/Nitride Stacked Films Prepared By In-Situ RTP Multiprocessing

Bhat, M., Yoon, G.W., Kim, J., Han, L,K., Yan, J., Wristers, D., Kwong, D.L.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12