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Polymers of α-Substituted Benzyl Methacrylates and Aliphatic Aldehydes as New Types of Electron-Beam Resists

Author(s):
Hatada, K.
Kitayama, T.
Okamoto, Y.
Yuki, H.
Aritome, H.
Namba, S.
Nate, K.
Inoue, T.
Yokono, H.
4 more
Publication title:
Materials for microlithography : radiation-sensitive polymers
Title of ser.:
ACS symposium series
Ser. no.:
266
Pub. Year:
1984
Page(from):
399
Pub. info.:
Washington, D.C.: American Chemical Society
ISSN:
00976156
ISBN:
9780841208711 [0841208719]
Language:
English
Call no.:
A05800/266
Type:
Conference Proceedings

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