Pulse Radiolysis Studies on the Mechanism of the High Sensitivity of Chloromethylated Polystyrene as an Electron Negative Resist

Pulse Radiolysis Studies on the Mechanism of the High Sensitivity of Chloromethylated Polystyrene as an Electron Negative Resist

Author(s):

Publication title:

Materials for microlithography : radiation-sensitive polymers

Title of ser.:

ACS symposium series

Ser. no.:

266

Pub. Year:

1984

Page(from):

151

Pub. info.:

Washington, D.C.: American Chemical Society

ISSN:

00976156

ISBN:

9780841208711 [0841208719]

Language:

English

Call no.:

A05800/266

Type:

Conference Proceedings

Details

TDL ID:	ZA00020799
Series ID:	PA00000004
Conf. info. (Name):	Meeting of the American Chemical Society
Conf. info. (Number):	187th
Conf. info. (Venue):	St. Louis, MO, USA
Conf. info. (Date):	1984.04.08-1984.04.13

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