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MICROSTRUCTURE OF Si FILMS DEPOSITED ON Si(100) SURFACES BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION, RPECVD: DEPENDENCE ON PROCESS PRESSURE AND SUBSTRATE TEMPERATURE

Author(s):
Publication title:
Phase transformations in thin films : thermodynamics and kinetics : symposium held April 13-15, 1993, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
311
Pub. Year:
1993
Page(from):
379
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992078 [1558992073]
Language:
English
Call no.:
M23500/311
Type:
Conference Proceedings

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