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Interface Interstitial Recombination Rate and the Reverse Short Channel Effect

Author(s):
Rubin, M. E.
Saha, S.
Lutze, J.
Nouri, F.
Scott, G.
Pramanik, D.
1 more
Publication title:
Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
568
Pub. date:
1999
Page(from):
213
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994751 [1558994750]
Language:
English
Call no.:
M23500/568
Type:
Conference Proceedings

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