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Ostwald Ripening of {113} Defects Precursors and Transient Enhanced Diffusion

Author(s):
Mannino, G.
Cowern, N. E. B.
Stolk, P. A.
Roozeboom, F.
Huizing, H. G. A.
Berkum, J. G. M. van
Boer, W. B. de
Cristiano, F.
Claverie, A.
Jaraiz, M.
5 more
Publication title:
Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
568
Pub. Year:
1999
Page(from):
163
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994751 [1558994750]
Language:
English
Call no.:
M23500/568
Type:
Conference Proceedings

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