Mechanical Property Measurement of 0.5ｦﾌm CMOS Microstructures

Mechanical Property Measurement of 0.5ｦﾌm CMOS Microstructures

Author(s):

Publication title:

Microelectromechanical structures for materials research : symposium held April 15-16, 1998 , San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

518

Pub. Year:

1998

Page(from):

27

Pub. info.:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994249 [1558994246]

Language:

English

Call no.:

M23500/518

Type:

Conference Proceedings

Details

TDL ID:	ZA00020785
Series ID:	PA00000011
Conf. info. (Name):	Symposium on microelectromechanical structures for materials research
Conf. info. (Number):	1998
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1998.04.15-1998.04.16

Similar Items:

1 Conference Proceedings In-line charge-trapping characterization of dielectrics for sub-0.5-ｦﾌm CMOS technologies (Invited Paper) Roy,P.K., Chacon,C.M., Ma,Y., Homer,C.S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings A MULTILAYER INTERCONNECT PROCESS FOR 0.5ｦﾌm LOGIC TECHNOLOGY Kim, Donghyun, Oh, H. S., Lee, K. Y., Kim, Y. S., Kim, B. S., Kim, B. G. MRS - Materials Research Society
2 Conference Proceedings FRAM technologies compatible with 0.5-ｦﾌm CMOS logics (Invited Paper) Furumura,Y., Yamazaki,T., Nakamura,M., Inoue,K., Miyazawa,H., Sashida,N., Satomi,R., Katoh,Y., Ozawa,S., Takai,K., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Integration of ICP high-density plasma CVD with CMP and its effects on planarity for sub-0.5-ｦﾌm CMOS technology Yota,J., Brongo,M.R., Dyer,T.W., Rafftesaeth,K.P., Bondur,J.A. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Merged 2.5-V and 3.3-V 0.25-ｦﾌm CMOS technology Kizilyalli,I.C., Huang,R.Y., Hwang,D., Kane,B.C., Ashton,R., Kuehne,S., Deng,X., Twiford,M.S., Martin,E.P., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Low-pressure aluminum planarization for sub-0.5-ｦﾌm via holes Biberger,M.A., Conci,D., Lyons,J., Rumer,M., Tam,L., Tkach,G., Hoffman,V., Martin,E.P., Merchant,S.M.,Jr. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Fabrication and characterization of gated Si field emitter arrays with gate aperture below 0.5 ｦﾌm Ku,T.-K., Hsieh,B.B., Chen,M.S., Wang,C.-C., Wang,P.W., Hsieh,I.-J., Cheng,H.-C. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Microstructure Evolution and Mechanical Properties of Mg-3Zn-0.5Er-0.5Al Alloy X.B. Zheng, W.B. Du, K. Liu, Z.H. Wang, S.B. Li Trans Tech Publications
5 Conference Proceedings Properties and Applications of ZrF4 Based Fibres in the 0.5 to 4.5 ｦﾌm Region France,P.W., Brierley,M.C., Carter,S.F., Moore,M.W., Williams,J.R., Day,C.R. Trans Tech Publications	11 Conference Proceedings Simulation of Resist Profiles for 0.5-ｦﾌm Photolithography at 248 nm Watts, R. K., Wolf, T. M., Stillwagon, L. E., Hellman, M. Y. American Chemical Society
6 Conference Proceedings A Two-Step, Lightly Nitrided Gate Oxidation process for Sub-0.5ｦﾌm CMOS Technology Roy, P. K., Ma, Y., Flemming, M. T. MRS - Materials Research Society	12 Conference Proceedings Tuned MEDICI simulator including inverse short channel effect for sub-0.18-ｦﾌm CMOS technologies Nandakumar,M., Sridhar,S., Vasanth,K., Hu,J.C., Shiau,W.-T., Mei,P., Rodder,M., Chen,I.-C. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12