RAMAN CHARACTERIZATION OF POLYCRYSTALLINE SILICON: STRESS PROFILE MEASUREMENTS

RAMAN CHARACTERIZATION OF POLYCRYSTALLINE SILICON: STRESS PROFILE MEASUREMENTS

Author(s):

Benrakkad, M. S.

Perez-Rodrigues, A.

Jahwari, T.

Samitier, J.

Lopez-Villegas, J. M.

Morante, J. R.

1 more

Publication title:

Polycrystalline thin films : structure, texture, properties, and applications : symposium held April 4-8, 1994, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

343

Pub. Year:

1994

Page(from):

609

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992436 [155899243X]

Language:

English

Call no.:

M23500/343

Type:

Conference Proceedings

Details

TDL ID:	ZA00020769
Series ID:	PA00000011
Conf. info. (Name):	Symposium on polycrystalline thin films
Conf. info. (Number):	1994
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.04.04-1994.04.08

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