CHEMICAL STABILITY OF REACTIVELY SPUTTERED AlN WITH PLASMA ENHANCED CHEMICAL VAPOR DEPOSITED SiO2 AND SiNx

CHEMICAL STABILITY OF REACTIVELY SPUTTERED AlN WITH PLASMA ENHANCED CHEMICAL VAPOR DEPOSITED SiO2 AND SiNx

Author(s):

Publication title:

Polycrystalline thin films : structure, texture, properties, and applications : symposium held April 4-8, 1994, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

343

Pub. Year:

1994

Page(from):

253

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992436 [155899243X]

Language:

English

Call no.:

M23500/343

Type:

Conference Proceedings

Details

TDL ID:	ZA00020769
Series ID:	PA00000011
Conf. info. (Name):	Symposium on polycrystalline thin films
Conf. info. (Number):	1994
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1994.04.04-1994.04.08

Similar Items:

1 Conference Proceedings IMPROVEMENT IN THE ACTIVATION EFFICIENCY OF IMPLANTED Si IN GaAs USING OXYGEN PLASMA PRETREATMENT Cho, Jaeshin, Pawlowicz, Leszek M., Saha, Naresh C. Materials Research Society	7 Conference Proceedings White photoluminescence from SiNx films prepared by plasma enhanced chemical vapor deposition [6337-31] Kang, Z. T., Wagner, B. K., Parrish, J., Summers, C. J. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Plasma-Enhanced Chemical Vapor Deposited SiNx and SiO2 Passivation Effects on ZnO Heterojunction Light Emitting Diodes Y. Wang, H. Kim, D.P. Norton, S.J. Pearton, F. Ren Electrochemical Society	8 Conference Proceedings Structural and optical properties of TiO2-SiO2 composite films deposited by chemical vapor deposition at low-SiO2-conetnt region Park,J.-H., Cho,W.-J., Hong,K.-S. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Kinetics Investigation of Remote Plasma-Enhanced Chemical Vapor Deposition of SiO2 Courtney, C.H., Lamb, H.H. Electrochemical Society	9 Conference Proceedings CHARACTERIZATION OF SPUTTERED Ge FILM Cho, Jaeshin, Theodore, N. David MRS - Materials Research Society
4 Conference Proceedings Characterization of a-SiNx Thin Film Deposited by Inductively-Coupled Plasma-Enhanced Chemical Vapor Deposition Han, Sang-Soo, Jun, Byung-Hyuk, No, Kwangsoo, Bae, Byeong-Soo MRS - Materials Research Society	10 Conference Proceedings Stress Hysteresis and Mechanical Characterization of Plasma-Enhanced Chemical Vapor Deposited Dielectrics Thurn, Jeremy, Cook, Robert F., Kamarajugadda, Mallika, Stearns, Laura C. Materials Research Society
5 Conference Proceedings STABILITY OF SPUTTER DEPOSITED A1-Cu BILAYERS ON SiO2 Nandan, R., Murarka, S. P., Pant, A., Shepard, C., Lanford, W. A. Materials Research Society	11 Conference Proceedings THE CHEMICAL INTERFACE OF MICROWAVE PLASMA DEPOSITED SiO2 FILMS Parks, C. C., Robinson, B., Leavy Jr., H. J., Childs, K. D., Coyle, Jr. G. J. Materials Research Society
6 Conference Proceedings Sticking Probability and Step Coverage Studies of SiO2 and Polymerized Siloxane Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition Theil, Jeremy A. MRS - Materials Research Society	12 Conference Proceedings Preparation of PZT Thin Films on Pt/Ti/SiO2 and Pt/SiO2 Substrates by ECR Plasma-Enhanced dc Magnetron Multitarget Reactive Sputtering Kim, Sung-Tae, Kim, Hyun-Ho, Lee, Moon-Yong, Lee, Won-Jong MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12