Monitoring optical properties and thickness of PECVD SiON antireflective layer by spectroscopic ellipsometry

Monitoring optical properties and thickness of PECVD SiON antireflective layer by spectroscopic ellipsometry

Author(s):

Publication title:

Metrology, Inspection, and Process Control for Microlithography XI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3050

Pub. Year:

1997

Page(from):

602

Page(to):

606

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424648 [0819424641]

Language:

English

Call no.:

P63600/3050

Type:

Conference Proceedings

Details

TDL ID:	ZA00020766
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	1997 : 11th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.12

Similar Items:

1 Conference Proceedings Footing reduction of positive deep-UV photoresists on plasma-enhanced ARL (PEARL) SiON substrates Joesten,L.A., Moynihan,M.L., Lindsay,T.K., Reilly,M., Konjuh,K., Mordo,D., MacWilliams,K.P., Sundararajan,S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings In-Line Measurement of Epitaxial Silicon-Germanium Thin Films by Spectroscopic Ellipsometry Liaw,H.M., Ygartua,C. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Optical properties of liquid metals studied by spectroscopic ellipsometry Krishnan,S., Yugawa,K.J., Nordine,P.C. SPIE-The International Society for Optical Engineering	8 Conference Proceedings In-Line Measurement of Epitaxial Silicon-Germanium Thin Films by Spectroscopic Ellipsometry Liaw, H.M., Ygartua, C. Electrochemical Society
3 Conference Proceedings SUPERLATTICE OPTICAL PROPERTIES MEASURED BY VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY Snyder, P. G., Merkel, K. G., De, B. N., Woollam, J. A., Langer, D. W., Stutz, C. E., Jones, R., Rai, A. K., Evans, K. Materials Research Society	9 Conference Proceedings Spectroscopic Ellipsometry in Optical Coatings Manufacturing J.N. Hilfiker, J.S. Hale, B.D. Johs, T.E. Tiwald, R.A. Synowicki, C.L. Bungay, J.A. Woollam Society of Vacuum Coaters
4 Conference Proceedings Determination and Critical Assessment of the Optical Properties of Common Substrate Materials Used in III-V Nitride Heterostructures with Vacuum Ultraviolet … Edwards, N.V., Lindquist, O.P.A., Madsen, L.D., Zollner, S., Jarrehdahl, K., Cobet, C., Peters, S., Esser, N., Konkar, … Materials Research Society	10 Conference Proceedings Pd-based films produced by PECVD for optical recording Gritsenko,K.P. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Real-Time Monitoring of Semiconductor Growth by Spectroscopic Ellipsometry Johs, B., Hale, J., Herzinger, C., Doctor, D., Elliott, K., Olson, G., Chow, D., Roth, J., Ferguson, I., Pelczynski, M., … MRS - Materials Research Society	11 Conference Proceedings High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry:a new tool for 300-mm-wafer technology Boher,P., Defranoux,C., Bourtault,S., Stehle,J.L.P. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Characterization of copper oxidation and reduction using spectroscopic ellipsometry Powell,R.A., Settles,D., Lane,L., Ygartua,C.L., Srivatsa,A.R., Hayzelden,C. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range Boher,P., Piel,J.P., Defranoux,C., Stehle,J.-L., Hennet,L. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12