Contact holes:a challenge for signal collection efficiency and measurement algorithms
- Author(s):
- Solecky,E. ( IBM Microelectronics Div. )
- Archie,C.N.
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3050
- Pub. Year:
- 1997
- Page(from):
- 172
- Page(to):
- 179
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424648 [0819424641]
- Language:
- English
- Call no.:
- P63600/3050
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Monitoring printing fidelity with image correlation measurements on the CD SEM
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Three-dimensional top-down metrology: a viable alternative to AFM or cross-section?
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Characterizing and understanding stray tilt: the next major contributor to CD SEM tool matching
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet [6152-38]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Total measurement uncertainty and total process precision evaluation of a structural metrology approach to monitoring post-CMP processes
SPIE - The International Society of Optical Engineering |