Improving the accuracy of overlay measurements through reduction in tool-and wafer-induced shifts
- Author(s):
- Preil,M.E. ( KLA Instruments Corp. )
- Plambeck,B.F.
- Uziel,Y.
- Zhou,H.
- Melvin,M.W.
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3050
- Pub. Year:
- 1997
- Page(from):
- 123
- Page(to):
- 134
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424648 [0819424641]
- Language:
- English
- Call no.:
- P63600/3050
- Type:
- Conference Proceedings
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