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High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors

Author(s):
Publication title:
Micromachining and microfabrication process technology II : 14-15 October, 1996, Austin, Texas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2879
Pub. date:
1996
Page(from):
94
Page(to):
102
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422774 [0819422770]
Language:
English
Call no.:
P63600/2879
Type:
Conference Proceedings

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