Blank Cover Image

High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors

Author(s):
Publication title:
Micromachining and microfabrication process technology II : 14-15 October, 1996, Austin, Texas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2879
Pub. Year:
1996
Page(from):
94
Page(to):
102
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422774 [0819422770]
Language:
English
Call no.:
P63600/2879
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication

Pandhumsoporn,T., Wang.L., Feldbaum,M., Gadgil,P., Puech,M., Maquin,P.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Effects of metal impuritites on the etch rate selectivity of(110)/(111)in(11O)Si anisotropic etching

Hirata,Y., Tsugai,M., Tanimoto,K., Usami,T., Yamaguchi,Y., Otani,H., Nakamura,K.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Deep anisotropic ICP plasma etching designed for high-volume MEMS manufacturing

Yu,K., Feldbaum,M., Pandhumsoporn,T., Gadgil,P.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Anisotropic etching of silicon for accelerometer chip fabrication

Saha, I., Joseph, J., Islam, R., John, J., Kanakaraju, K., Jain, Y.K., Alex, T.K.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings High-Rate Anisotropic Silicon Etching with the Expanding Thermal Plasma Technique

M.A. Blauw, P. Van Lankvelt, F. Roozeboom, E. Kessels, R. van de Sanden

Electrochemical Society
9 Conference Proceedings Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers

Shew, B.-Y., Huang, R.-S., Wang, D.-J., Perng, S.-Y., Kuan, C.-K., Cai, Y.Q., Chow, P.C., Schwoerer-Boehning, M., …

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Etching technology and applications for through-the-wafer silicon etching

Craven,D.R., Yu,K., Pandhumsoporn,T.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Plasma etching of Cr films in the fabrication of photomasks:II.a comparison of etch technologies and a first look at defects

Coleman,T.P., Buck,P.D., Johnson,D.J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Silicon waveguide fabrication process based on the anisotropic etching of Si<111>- oriented wafers

Cristea, D., Obreja, P., Manea, E., Kusko, M.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings 1D periodic structures obtained by deep anisotropic etching of silicon

Astrova, E. V., Perova, T.S., Tolmachev, V.A.

Kluwer Academic Publishers
6 Conference Proceedings Cmparison of Etching Plasmas for Deep Trench Silicon Etch Process

Ranade, R., Mathad, G.S.

Electrochemical Society
12 Conference Proceedings Fabrication method of large-core polymeric optical waveguide through replication process using anisotropically etched silicon

Mizuno, H., Sugihara, O., Kaino, T., Okamoto, N., Tomiki, M., Hoshino, M.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12