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High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication

Author(s):
Pandhumsoporn,T. ( Alcatel Comptech Inc. )
Wang.L. ( Alcatel Comptech Inc. )
Feldbaum,M. ( Alcatel Comptech Inc. )
Gadgil,P. ( Alcatel Comptech Inc. )
Puech,M. ( Alcatel CIT (France) )
Maquin,P. ( Alcatel CIT (France) )
1 more
Publication title:
Smart structures and materials 1998 : smart electronics and MEMS : 2-4 March 1998, San Diego, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3328
Pub. date:
1998
Page(from):
93
Page(to):
101
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427724 [0819427721]
Language:
English
Call no.:
P63600/3328
Type:
Conference Proceedings

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