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Defining conditions for the etching of silicon in an inductive coupled plasma reactor

Author(s):
Ashraf, H.
Bhardwaj, J. K.
Guibarra, E.
Hall, S.
Hopkins, J.
Hynes, A. M.
Johnston, I.
Lea, L.
McCauley, S.
Nicholls, G.
O'Brien, P.
6 more
Publication title:
Materials science of microelectromechanical systems (MEMS) devices II : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
605
Pub. Year:
2000
Page(from):
299
Pub. info.:
Warrendale, Pa.: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995130 [1558995137]
Language:
English
Call no.:
M23500/605
Type:
Conference Proceedings

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