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Silicon Surface Chemistry by IR Spectroscopy in the Mid- to Far-IR Region: H2O and Ethanol on Si(100)

Author(s):
Struck, L. M.
Eng, J., Jr.
Bent, B. E.
Chabal, Y. J.
Williams, G. P.
White, A. E.
Christman, S.
Chaban, E. E.
Raghavachari, K.
Flynn, G. W.
Radermacher, K.
Mantl, S.
7 more
Publication title:
Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
386
Pub. date:
1995
Page(from):
395
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992894 [1558992898]
Language:
English
Call no.:
M23500/386
Type:
Conference Proceedings

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