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Valence Band Alignment of Ultra-Thin SiO2/Si Interfaces as Determined by High Resolution X-ray Photoelectron Spectroscopy

Author(s):
Alay, J. L.
Fukuda, M.
Bjorkman, C. H.
Nakagawa, K.
Sasaki, S.
Yokoyama, S.
Hirose, M.
2 more
Publication title:
Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
386
Pub. Year:
1995
Page(from):
249
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992894 [1558992898]
Language:
English
Call no.:
M23500/386
Type:
Conference Proceedings

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