Blank Cover Image

Investigation of Pre-Tungsten Silicide Deposition Wet Chemical Processing

Author(s):
Publication title:
Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
386
Pub. Year:
1995
Page(from):
75
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992894 [1558992898]
Language:
English
Call no.:
M23500/386
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings SURFACE ROUGHNESS INVESTIGATION OF THIN SiO2 FILMS DEPOSITED FROM N2O AND SiH4

Watt, V. H. C., Moinpour, M., Sadjadi, R., Lu, W., Neubauer, G., Bower, R.

MRS - Materials Research Society
7 Conference Proceedings Direct Bonding of LPCVD Silicon Oxide Thin Films Deposited from N2O and SiH4

Watt, V.H.C., Bower, R., Chan, W., Hong, L., Moinpour, M.

Electrochemical Society
2 Conference Proceedings IN SITU CONTAMINATION CONTROL INVESTIGATION OF SILICON NITRIDE LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS IN VERTICAL THERMAL REACTORS

Moinpour, Mansour, Bohannan, K., Shenasa, M., Sharif, A., Guzzo, G., Brestovansky, D.F., Markle, R.J., Wilkes, R.

Materials Research Society
8 Conference Proceedings TEOS/Ozone APCVD Thin SiO2 Sub 0.5 mm LDD Spacer Applications

Moinpour, M., Lu, W.-J., Sadjadi, R., Li, J., Moghadam, F., Wada, O., Watt, V.H.C.

Electrochemical Society
3 Conference Proceedings Characterization of tungsten silicide(WSix)film grown by chemical vapor deposition(CVD)

Hossain,F.R., Ambadi,S., Winer,R., Kitt,K., Garcia,C., Pearse,J.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings IMPLICATIONS OF SURFACE CONTAMINANTS IN A BPSG DEPOSITION AND REFLOW PROCESS

Moinpour, M., Leitch, R., Li, J., Thach, D., Moghadam, F.

MRS - Materials Research Society
4 Conference Proceedings Current Issues and Future Trends in CMP Consumables for Oxide and Metal Polish

Moinpour, M., Philipossian, A.

MRS - Materials Research Society
10 Conference Proceedings THE MODELING ROUTES FOR THE CHEMICAL VAPOR DEPOSITION PROCESS

Pons, M., Bernard, C., Rouch, H., Madar, R.

MRS - Materials Research Society
5 Conference Proceedings Statistical Characterization of Tungsten Silicide Deposition Process

Lu, Z., Elias, R., Arora, R.

Electrochemical Society
11 Conference Proceedings Characterization Of Silicon Dioxide Films Deposited In A Vertical Diffusion Furnace For Medium Temperature Applications

Watt, V.H.C., Nakatani, D., Moinpour, M., Hwang, D., Lu, W.

Electrochemical Society
6 Conference Proceedings Processing of Tungsten Single Crystals by Chemical Vapor Deposition

Zee, R., Xiao, Z., Gale, H.S., Chin, B.A., Begg, L.L.

Electrochemical Society
12 Conference Proceedings *PRE-CRACKING AND PLASMA ENHANCED METALORGANIC CHEMICAL VAPOR DEPOSITION PROCESSES FOR EPITAXIAL Hg1-xCdxTe AND HgTe-CdTe SUPERLATTICE GROWTH

Lu, P. -Y., Williams, L. M., Wang, C. -H., Chu, S. N. G., Ross, M. H.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12