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The Influence of Fluorine on Various MOS Devices

Author(s):
Innertsberger, G.
Jurk, R.
Felsner, J.
Kakoschke, R.
Yuwono, B.
Schlosser, T.
Krautschneider, W.
Gschwandtner, A.
3 more
Publication title:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
567
Pub. date:
1999
Page(from):
589
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
Language:
English
Call no.:
M23500/567
Type:
Conference Proceedings

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