Effect of Al, Ta, and O Precursors on Growth and Properties of Al2O3 and Ta2O5 Thin Films Deposited by Triode PECVD

Effect of Al, Ta, and O Precursors on Growth and Properties of Al2O3 and Ta2O5 Thin Films Deposited by Triode PECVD

Author(s):

Publication title:

Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

567

Pub. Year:

1999

Page(from):

445

Pub. info.:

Warrendale, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994744 [1558994742]

Language:

English

Call no.:

M23500/567

Type:

Conference Proceedings

Details

TDL ID:	ZA00020318
Series ID:	PA00000011
Conf. info. (Name):	Symposium on ultrathin SiO2 and high-K materials for ulsi gate dielectrics
Conf. info. (Number):	1999
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1999.04.05-1999.04.08

Similar Items:

1 Conference Proceedings COMPOSITION AND PROPERTIES OF PECVD SILICON NITRIDE FILMS DEPOSITED FROM SiH4, N2, He GASES Souk, J.H., Parsons, G.N., Batey, J. Materials Research Society	7 Conference Proceedings Correlations Between Composition, Texture, and Polarization in SrxBiyTa2O5+x+3y/2 Thin Films Deposited by MOCVD Hendrix, B. C., Hintermaier, F., Desrochers, D. A., Roeder, J. F., Baum, T. H., Dehm, C., Nagel, N., Honlein, W., … MRS - Materials Research Society
2 Conference Proceedings EFFECT OF POST-ANNEALING ON ELECTRICAL PROPERTIES OF Ta2O5 THIN FILM DEPOSITED BY PECVD USING TaCl5 AND N2O Park, Jong-Wan, Han, S. W., Moon, H. S., Lee, J. S. MRS - Materials Research Society	8 Conference Proceedings ZrO2 thin films deposited on various LiB3O5 substrates by electron beam evaporation Tan, T., Huang, J., Zhan, M., Tian, G., Shao, J., Fan, Z. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Kinetic Growth of Al2O3 Thin Films Using Aluminium Dimethylisopropoxide as Precursor Banreca, D., Barrison, G.A., Genhasi, R., Tondello, E. Electrochemical Society	9 Conference Proceedings Effects of Sputtered Ir and IrO2 Electrodes on the Properties of PZT Thin Films Deposited by MOCVD Shimizu, M., Fujisawa, H., Hyodo, S., Nakashima, S., Niu, H., Okino, H., Shiosaki, T. MRS - Materials Research Society
4 Conference Proceedings Microstructural Properties of PZT Thin Films Deposited on LaNiO3-Coated Substrates Z. Brankovic, G. Brankovic, K. Vojisavljevic, M. Pocuca, T. Sreckvic, D. Vasiljevic-Radovic Trans Tech Publications	10 Conference Proceedings Effect of Anti-blocking Particles on Oxygen Transmission Rate of SiOx Barrier Coatings Deposited by PECVD on PET Films P. Fayet, B. Jaccoud, R. Davis, D. Klein Society of Vacuum Coaters
5 Conference Proceedings GROWTH AND PROPERTIES OF EPITAXIAL YBa2Cu3O7 THIN FILMS ON (1102) A12O3 Fork, D.K., Geballe, T.H., Char, K., Laderman, S.S., Taber, R., Bridges, F., Ponce, F., Boyce, J.B., Connell, G.A.N. Materials Research Society	11 Conference Proceedings 204d. Atomic Layer Deposited Y2O3 Thin Films Using Novel Cyclopentadienyl-Type Yttrium Precursor Christos G. Takoudis American Institute of Chemical Engineers
6 Conference Proceedings TuD3:Crystallization behavior of sputter-deposited nitrogen-doped amorphous Ge2Sb2Te5 thin films Seo,H., Jeong,T.-H., Park,J.-W., Yeon,C., Lee,D.-C., Kim,S.-J., Lim,H.-J., Kim,S.-Y. SPIE - The International Society for Optical Engineering	12 Conference Proceedings The Role of Precursor Chemistry in the Ferroelectric Properties of Donor Doped Pb(Zr,Ti)O3 Thin Films Fe, L., Malic, B., Norga, G., Kosec, M., Wouters, D. J., Bartic, T. A., Maes, H. E. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12