Blank Cover Image

Fabrication of Ta2O5 Thin Films by Anodic Oxidation of Tantalum Nitride and Tantalum Silicide: Growing Mechanisms, Electrical Characterization and ULSI M-I-M Capacitor Performances

Author(s):
Publication title:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
567
Pub. Year:
1999
Page(from):
371
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
Language:
English
Call no.:
M23500/567
Type:
Conference Proceedings

Similar Items:

Duenas, S., Castan, H., Barbolla, J., Kola, R.R., Sullivan, P.A.

Materials Research Society

Park, Jong-Wan, Jeon, Seok-Ryong, Lee, Jae-Suk, Lee, Jeong-Youb

MRS - Materials Research Society

Duenas, S., Castan, H., Garcia, H., Barbolla, J., Kukli, K., Ritala, M., Leskela, M.

Materials Research Society

Duenas, S., Pelaez, R., Castan, E., Barbolla, J., Martil, I., Gonzalez-Diaz, G.

MRS - Materials Research Society

Castan, H., Duenas, S., Barbolla, J., Del Prado, A., San Andres, E., Martil, I., Gonzalez-Diaz, G.

Materials Research Society

Castan, H., Duenas, S., Barbolla, J., Martil, I., Gonzalez-Diaz, G.

Materials Research Society

Morcan, G., Ang, S.S., Brown, W.D., Schaper, L.W., Lenihan, T.G.

Electrochemical Society

Venkataraman, Shankar K., Nelson, John C., Moody, Neville R., Kohlstedt, David L., Gerberich, William W.

MRS - Materials Research Society

Duenas, S., Castan, H., Garcia, H., Bailon, L., KuKli, K., Ritala, M., Leskela, M.

Springer

Hitchens, William R., Krusell, Wilbur C., Dobkin, Daniel M.

Materials Research Society

Purswani, J.M., Pons, A.P., Glass, J.T., Evans, R.D., Cogdell, J.D.

Materials Research Society

Baumann, R.C., Rost, T.A., Rabson, T.A.

Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12