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Remote Plasma-Enhanced-Metal Organic Chemical Vapor Deposition of Zirconium Oxide/Silicon Oxide Alloy, (ZrO2)x-(SiO2)1-x (x 。?0.5), Thin Films for Advanced High-K Gate Dielectrics

Author(s):
Wolfe, D.
Flock, K.
Therrien, R.
Johnson, R.
Rayner, B.
Gunther, L.
Brown, N.
Claflin, B.
Lucovsky, G.
4 more
Publication title:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
567
Pub. date:
1999
Page(from):
343
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
Language:
English
Call no.:
M23500/567
Type:
Conference Proceedings

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