Blank Cover Image

Ultrathin Oxide Film Formation Using Radical Oxygen in a UHV System

Author(s):
Publication title:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
567
Pub. date:
1999
Page(from):
27
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
Language:
English
Call no.:
M23500/567
Type:
Conference Proceedings

Similar Items:

Watanabe, K., Togo, M., Tatsumi, T.

MRS-Materials Research Society

7 Conference Proceedings Soft Breakdown in Ultrathin Oxides

Weir, B. E., Silverman, P. J., Alers, G. B., Monroe, D., Alam, M. A., Sorsch, T. W., Green, M. L., Timp, G. L., Ma, Y., …

MRS - Materials Research Society

Tatsumi, T., Aoyama, K.

Electrochemical Society

Watanabe, K., Sakairi, M., Takahashi, H., Hirai, S., Nagata, S.

Electrochemical Society

Shishiguchi,S., Yasunaga,T., Aoyama,T., Tatsumi,T., Saito,S.

SPIE-The International Society for Optical Engineering

H. Aoki, S. Tokuyama, M. K. Mazumder, D. Watanabe, C. Kimura

Society of Photo-optical Instrumentation Engineers

Endo, K., Shinoda, K., Tatsumi, T.

Materials Research Society

Izumi, A., Sohara, S., Kudo, M., Matsumura, H.

MRS - Materials Research Society

Asmus -D. K.

Plenum Press

Che, S., Tatsumi, T.

Elsevier

Inoue, S., Kawagoe, Y., Yamanishi, K., Tanaka, M.

MRS - Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12