Blank Cover Image

Low-Temperature Formation of SiO2 and High Dielectrics Constant Material for ULSI in the 21st Century

Author(s):
Ohmi, T.
Sekine, K.
Kaihara, R.
Saito, Y.
Shirai, Y.
Hirayama, M.
1 more
Publication title:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
567
Pub. date:
1999
Page(from):
3
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
Language:
English
Call no.:
M23500/567
Type:
Conference Proceedings

Similar Items:

Saito, Y., Sekine, K., Hirayama, M., Ohmi, T.

Electrochemical Society

Woo, L., Ling, M. T. K., Ding, S. Y., Khare, A. R.

Society of Plastics Engineers, Inc. (SPE)

Kaihara, R., Hirayama, M., Ohmi, T.

Electrochemical Society

Woo, L., Ling, M. T. K., Ding, S. Y., Khare, A. R.

Society of Plastics Engineers, Inc. (SPE)

Ohmi, T., Sugawa, S., Hirayama, M.

Electrochemical Society

Woo L., Ling K. T. M., Ding Y. S., Khare R. A.

Society of Plastics Engineers, Inc. (SPE)

Gomi, H., Kishimoto, K., Koyanagi, K-I., Matsubara, Y., Oda, N., Usami, T., Yokoyama, T.

Materials Research Society

Ohmi, Tadahiro, Sugawa, Shigetoshi, Hirayama, Masaki

Electrochemical Society

Gomi, H., Kishimoto, K., Usami, T., Koyanagi, K-I., Yokoyama, T., Oda, N., Matsubara, Y.

MRS - Materials Research Society

Standaert, T. E. F. M., Matsuo, P. J., Allen, S. D., Oehrlein, G. S., Dalton, T. J., Lu, T.-M., Gutmann, R.

MRS - Materials Research Society

Ohmi, T., Okada, Y., Yabune, T., Ohmi, K.

Electrochemical Society

Yoshikawa, K., Kimura, T., Noshiro, H., Ohtani, S., Yamada, M., Furumura, Y.

MRS - Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12