Out-Diffusion of Oxygen in Czochralski Silicon at Low Temperatures

Out-Diffusion of Oxygen in Czochralski Silicon at Low Temperatures

Author(s):

McQuaid, S. A.

Publication title:

Diffusion mechanisms in crystalline materials : symposium held April 13-16, 1998, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

527

Pub. Year:

1998

Page(from):

389

Pub. info.:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994331 [1558994335]

Language:

English

Call no.:

M23500/527

Type:

Conference Proceedings

Details

TDL ID:	ZA00020315
Series ID:	PA00000011
Conf. info. (Name):	Symposium on diffusion mechanisms in crystalline materials
Conf. info. (Number):	1998
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1998.04.13-1998.04.16

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