Image Sensors in TFA Technology-Status and Future Trends
- Author(s):
Bohm, M. Blecher, F. Eckhardt, A. Seibel, K. Schneider, B. Sterzel, J. Benthien, S. Keller, H. Lule, T. Rieve, P. Sommer, M. Uffel, B. van Librecht, F. Lind, R. C. Humm, L. Efron, U. Roth, E. - Publication title:
- Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 507
- Pub. Year:
- 1999
- Page(from):
- 327
- Pub. info.:
- Warrendale: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994133 [1558994130]
- Language:
- English
- Call no.:
- M23500/507
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
Materials Research Society |
Materials Research Society |
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Thin Film on ASIC (TFA) - A Technology for Advanced Image Sensor Applications
Materials Research Society |
9
Technical Paper
Advanced Safety Technology for Children and Young Adults: Trends and Future Challenges.
Society of Automotive Engineers |
4
Conference Proceedings
Noise of a-Si:H Pin Diode Pixels in Imagers at Different Operating Conditions
Materials Research Society |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Photo- and Dark-Current Noise in a-Si:H pin Diodes at Forward and Reverse Bias
MRS - Materials Research Society |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
New Method to Determine the a-Si:H Diode Series Resistance by Noise Measurements
MRS - Materials Research Society |
Electrochemical Society |