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SILICON-CARBON RANDOM ALLOY EPITAXY ON SILICON BY RAPID THERMAL CHEMICAL VAPOR DEPOSITION

Author(s):
Mi, J.
Letourneau, P.
Ganiere, J. -D.
Gailhanou, M.
Dutoit, M.
Dubois, C.
Dupuy, J. C.
2 more
Publication title:
Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
342
Pub. Year:
1994
Page(from):
255
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992429 [1558992421]
Language:
English
Call no.:
M23500/342
Type:
Conference Proceedings

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