Evaluation of TER-SYSTEM resist for 193-nm imaging
- Author(s):
Johnson,D.W. ( Microlithography Chemical Corp. ) Egbe,M.I. Chen,C. Lin,L. Liao,Y. Bukasa,N.C. Suzuki,Y. - Publication title:
- Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3049
- Pub. Year:
- 1997
- Page(from):
- 997
- Page(to):
- 1009
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424631 [0819424633]
- Language:
- English
- Call no.:
- P63600/3049
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Verification of high-transmittance PSM with polarization at 193-nm high-NA system
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
193-nm imaging using a small-field high-resolution imaging resist exposure tool
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Evaluating resist degradation during reactive ion oxide etching using 193 nm model resist formulations [6153-25]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |