Use of complex coordination chemistry for the deposition of inorganic materials:spin on metals and photoresist-free lithography

Use of complex coordination chemistry for the deposition of inorganic materials:spin on metals and photoresist-free lithography

Author(s):

Blair,S.L. ( Simon Fraser Univ. )
Chu,C.W.
Dammel,R.R.
Hill,R.H.

Publication title:

Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3049

Pub. Year:

1997

Page(from):

829

Page(to):

837

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424631 [0819424633]

Language:

English

Call no.:

P63600/3049

Type:

Conference Proceedings

Details

TDL ID:	ZA00020295
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1997 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.10-1997.03.12

Similar Items:

1 Conference Proceedings An inorganic approach to photolithography: the photolithographic deposition of dielectric metal oxide films Hill, Ross H., Blair, Sharon L. American Chemical Society	7 Conference Proceedings Photoresist characterization for lithography simulation:III.Development parameter measurements Henderson,C.L., Tsiartas,P.C., Pancholi,S., Chowdhury,S.A., Dombrowski,K.D., Willson,C.G., Dammel,R.R. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Photoresist materials:a historical perspective Willson,C.G., Dammel,R.R., Reiser,A. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Electrochemical deposition of photoresists Chandrasekaran, K., Hill, M.J., Hamilton, W.L., Nguyen, H.V., Collins, R.W. American Chemical Society
3 Conference Proceedings Photoresist materials:a historical perspective Willson,C.G., Dammel,R.R., Reiser,A. SPIE-The International Society for Optical Engineering	9 Conference Proceedings New materials for 157-nm photoresists characterization and properties Crawford,M.K., Feiring,A.E., Feldman,J., French,R.H., Periyasamy,M.P., III,F.L.Schadt, Smalley,R.J., Zurnsteg,F.C., … SPIE - The International Society for Optical Engineering
4 Conference Proceedings Photoresist materials:a historical perspective Willson,C.G., Dammel,R.R., Reiser,A. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Photoresists for microlithography, or The Red Queen's Race (Invited Paper) Dammel, R.R. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Photoresist materials:a historical perspective Willson,C.G., Dammel,R.R., Reiser,A. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Bleaching-induced changes in the dispersion curves of DNQ photoresists Henderson,C.L., Willson,C.G., Dammel,R.R., Synowicki,R.A. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Photoresist characterization for lithography simulation:II.Exposure parameter measurements Henderson,C.L., Pancholi,S., Chowdhury,S.A., Willson,C.G., Dammel,R.R. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Enhanced i-line lithography using AZ BARLi coating Yang,T.-S., Kook,T.H., Josephson,W.A., Spak,M.A., Dammel,R.R. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12